The Simplest and Easiest to Use Maskless
Lithography System on the Market, the SF-100 XCEL
The new SF-100 XCEL has been developed for a wide
range of lithography applications. IMP has taken the
same UV optics that are used on other SF-100 models
and packaged them in a simple, very reliable system
that can provide for features as small as 5 microns in
size.
Since these processes use standard photoresists,
polyimides, or SU8 materials, the SF-100 XCEL
integrates easily into your existing photolithography line.
The applications for this system are endless. Use the
SF-100 XCEL to train students in basic processing,
pattern a variety of features for non-critical applications,
and even perform lithography on curved substrates. All
of these capabilities are available to you at a low system
price.
Lithography System on the Market, the SF-100 XCEL
The new SF-100 XCEL has been developed for a wide
range of lithography applications. IMP has taken the
same UV optics that are used on other SF-100 models
and packaged them in a simple, very reliable system
that can provide for features as small as 5 microns in
size.
Since these processes use standard photoresists,
polyimides, or SU8 materials, the SF-100 XCEL
integrates easily into your existing photolithography line.
The applications for this system are endless. Use the
SF-100 XCEL to train students in basic processing,
pattern a variety of features for non-critical applications,
and even perform lithography on curved substrates. All
of these capabilities are available to you at a low system
price.
| SF-100 XCEL |
| Labtec Midwest Sales 3308 Preston Road Suite 300-211 Plano, Texas 75093 800-749-7473 ext 101 800-749-7473 fax sales@labtecsemi.com |
Small Lines at a Great Price. Meet the SF-100
XPRESS
Since July, 2008, the SF-100 XTREME has been the
industry’s leading maskless lithography solution for
patterning lines as small as 1 micron in size, with
previously unheard of flexibility and performance.
However, since all user’s are not in a financial position
to purchase this superior system, we have introduced
the SF-100 XPRESS. This system is built on the same
platform as the SF-100 XTREME, but offers the user
the ability to customize their SF-100 XPRESS for their
specific needs, purchasing only those features that
are critical to their process. The result is the same
exceptional performance at a lower cost. And, since
both systems utilize the same platform, the SF-100
XPRESS can be fully upgraded in the field to an SF-
100 XTREME.
XPRESS
Since July, 2008, the SF-100 XTREME has been the
industry’s leading maskless lithography solution for
patterning lines as small as 1 micron in size, with
previously unheard of flexibility and performance.
However, since all user’s are not in a financial position
to purchase this superior system, we have introduced
the SF-100 XPRESS. This system is built on the same
platform as the SF-100 XTREME, but offers the user
the ability to customize their SF-100 XPRESS for their
specific needs, purchasing only those features that
are critical to their process. The result is the same
exceptional performance at a lower cost. And, since
both systems utilize the same platform, the SF-100
XPRESS can be fully upgraded in the field to an SF-
100 XTREME.
The SF-100 XTREME: Full Featured & Versatile
Maskless Microlithography
If you need a complete maskless lithography system to
do advanced research or photomask fabrication, look
no further than the SF-100 XTREME. This system
comes with everything you need to do high precision,
quick turnaround maskless photoresist patterning.
Through advanced system design, important process
variables such as exposure wavelength, pixel size and
exposure energy level are easily chosen by the user so
the system can work within your existing process and be
compatible with your existing materials.
Maskless Microlithography
If you need a complete maskless lithography system to
do advanced research or photomask fabrication, look
no further than the SF-100 XTREME. This system
comes with everything you need to do high precision,
quick turnaround maskless photoresist patterning.
Through advanced system design, important process
variables such as exposure wavelength, pixel size and
exposure energy level are easily chosen by the user so
the system can work within your existing process and be
compatible with your existing materials.
SF-100 XTREME
| SF-100 XPRESS |