The World Leader in Atomic Level Deposition Since 1974
| Labtec Midwest Sales 3308 Preston Road Suite 300-211 Plano, Texas 75093 800-749-7473 ext 101 800-749-7473 fax sales@labtecsemi.com |
SUNALE™ R-series Atomic Layer Deposition (ALD) Reactors
SUNALE™ R-series Atomic Layer Deposition (ALD) reactors are
optimized for research, product development and pilot production.
The versatile reactor design enables deposition on 2-8’’ (50-200
mm) wafers, 3-dimensional objects and porous substrates.
Reaction chamber materials are selected to withstand corrosive
process chemistries. The process tools can be upgraded with
various precursor source, reactor chamber and substrate loader
options, as well as an ozone delivery system or a nitrogen
generator.
SUNALE™ R-series Atomic Layer Deposition (ALD) reactors are
optimized for research, product development and pilot production.
The versatile reactor design enables deposition on 2-8’’ (50-200
mm) wafers, 3-dimensional objects and porous substrates.
Reaction chamber materials are selected to withstand corrosive
process chemistries. The process tools can be upgraded with
various precursor source, reactor chamber and substrate loader
options, as well as an ozone delivery system or a nitrogen
generator.
SUNALE™ P-series Atomic Layer Deposition (ALD) systems
SUNALE™ P-series Atomic Layer Deposition (ALD) systems set a
new standard for ALD production tools, providing extremely fast
process times and very low cost of ownership with the patented
design solely based on the requirements of the ALD method.
The reactor design is optimized for efficient processing of
batches for 4-12” or 156x156 mm2 wafers with high through-put
that fulfills HVM requirements for both for electronics
manufacturing and solar applications.
SUNALE™ P-series ALD tools are reliable, have a small footprint
and are fully compatible with the most stringent clean room
processing requirements.
Operation and maintenance of the SUNALE™ P-series ALD tools
is fast and simple. Excellent particle performance and short cycle
times can be reached thanks to the unique batch chamber
design.
Performance of the ALD system can be maximized with
automated loading systems. SUNALE™ P-series ALD systems
have been selected by production customers on three continents.
SUNALE™ P-series Atomic Layer Deposition (ALD) systems set a
new standard for ALD production tools, providing extremely fast
process times and very low cost of ownership with the patented
design solely based on the requirements of the ALD method.
The reactor design is optimized for efficient processing of
batches for 4-12” or 156x156 mm2 wafers with high through-put
that fulfills HVM requirements for both for electronics
manufacturing and solar applications.
SUNALE™ P-series ALD tools are reliable, have a small footprint
and are fully compatible with the most stringent clean room
processing requirements.
Operation and maintenance of the SUNALE™ P-series ALD tools
is fast and simple. Excellent particle performance and short cycle
times can be reached thanks to the unique batch chamber
design.
Performance of the ALD system can be maximized with
automated loading systems. SUNALE™ P-series ALD systems
have been selected by production customers on three continents.
