JLS Plasma Etch Systems
Plasma Pod
New for 2010 the Plasma Pod offers customers a benchtop
plasma etching system.
The Plasma Pod is equipped with up to 3 gas lines, 300 watt RF
generator, automatic matching unit, turbo molecular pump ,
automatic pressure control and full PLC control unit with touch
screen interface.
System dimensions are 560 mm x 390 mm x 620 mm.
The system has an aluminium chamber with a water cooled
electrode which can accept up to a 125 mm diameter substrate.
New for 2010 the Plasma Pod offers customers a benchtop
plasma etching system.
The Plasma Pod is equipped with up to 3 gas lines, 300 watt RF
generator, automatic matching unit, turbo molecular pump ,
automatic pressure control and full PLC control unit with touch
screen interface.
System dimensions are 560 mm x 390 mm x 620 mm.
The system has an aluminium chamber with a water cooled
electrode which can accept up to a 125 mm diameter substrate.
Prog 200 Plasma Etching System
The PROG200 Etch system is a cost effective, reliable unit
designed for use in R&D, III-V processing and all types of
training institutes. With a range of options with this tool such
as RF sources, gas modules and vacuum arrangements this
system provides a lot of customization.
The PROG200 Etch system is a cost effective, reliable unit
designed for use in R&D, III-V processing and all types of
training institutes. With a range of options with this tool such
as RF sources, gas modules and vacuum arrangements this
system provides a lot of customization.
MPS 1400 ICP Plasma Etch System
The MPS 1400 ICP system is configured with a 3Kw ICP
source and a with a helium back cooled substrate electrode.
The system also comes with 1 year warranty, full spares
support and the option for further service contracts.
The MPS 1400 ICP system is configured with a 3Kw ICP
source and a with a helium back cooled substrate electrode.
The system also comes with 1 year warranty, full spares
support and the option for further service contracts.
MPS 2200 Plasma Deposition or Etch System
The Mini-Lab MPS 2200 is designed for large area
deposition or etch processing. The system has a
stainless steel chamber which houses a 500mm diameter
electrode. The system can be supplied with a variety of
RF sources and pumping arrangements.
The Mini-Lab MPS 2200 is designed for large area
deposition or etch processing. The system has a
stainless steel chamber which houses a 500mm diameter
electrode. The system can be supplied with a variety of
RF sources and pumping arrangements.
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Please Contact Labtec Sales for Custom Designs
| Labtec Midwest Sales 3308 Preston Road Suite 300-211 Plano, Texas 75093 800-749-7473 ext 101 800-749-7473 fax sales@labtecsemi.com |
